Non-contact temperature measurement of a film growing on a substrate
US5377126A · kind A · utility
36Cited by
8References
4Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 13, 1991 |
| Grant date | Dec 27, 1994 |
| Priority date | — |
| Expiry date | Sep 13, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/842
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus and method for non-contact temperature measurement of a film growing on a substrate which accounts for the change in emissivity due to the change in film thickness. The system employs an adaptively calibrated pyrometer wherein the substrate emittance is continuously computed so that the temperature measurement is accurate regardless of the emittance variation. The new system is easily constructed by adding data processing system software and hardware to conventional pyrometers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.