Precision cleaning system
US5377705A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 16, 1993 |
| Grant date | Jan 3, 1995 |
| Priority date | — |
| Expiry date | Sep 16, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An improved precision cleaning method includes introducing a solvent to a cleaning vessel, placing a workpiece in the cleaning vessel and contacting the workpiece with the solvent during a residence period. The cleaning vessel is then pressurized to a target pressure by adding carbon dioxide to the vessel, and additional carbon dioxide is pumped into the vessel while maintaining the target pressure to flush contents of the vessel. Cleaning may be enhanced by pressurizing to above the supercritical point of the carbon dioxide, and cleaning is further enhanced by application of sonic energy or mechanical agitation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.