Patent · US Expired

Apparatus for coating substrates using a microwave ECR plasma source

US5378284A · kind A · utility

20Cited by

4References

7Claims

0Family size

Assignee

Leybold GmBH · DE

Inventors

Michael Geisler · Apolda, DE
Rudolf Koetter-Faulhaber · Karben, DE
Michael Jung · Frankfurt am Main, DE

Key dates

Filing date	Jun 30, 1992
Grant date	Jan 3, 1995
Priority date	—
Expiry date	Jun 30, 2012

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/511
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

An apparatus and a method for producing layers on the surfaces of workpieces, preferably on spotlight, or headlight, reflector inserts formed of plastic, includes an apparatus having a vacuum chamber that can be operated as a batch system with a PCVD coating process, where a microwave ECR plasma coating source is used, and the workpieces to be coated are secured to a rotary cage arranged in the vacuum chamber. The rotary cage can be conducted past a microwave coating source with a frequency-matched and phase-matched planetary motion. Such a coating process can be used in a vacuum chamber, under plasma, and at pressures below 2.times.10.sup.-2 mbar.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.