Process for cleaning harmful gas
US5378444A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 13, 1992 |
| Grant date | Jan 3, 1995 |
| Priority date | — |
| Expiry date | Nov 13, 2012 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D53/68
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process or leaked suddenly from a gas bomb in an emergency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.