Cleaning apparatus
US5379785A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 11, 1992 |
| Grant date | Jan 10, 1995 |
| Priority date | — |
| Expiry date | Mar 11, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A cleaning apparatus and a cleaning method effectively clean the entire surface of a substrate to be cleaned by uniformly irradiating ultrasonic waves to the substrate. Ultrasonic waves generated by an ultrasonic oscillator provided on the side wall of an outer tank are transmitted through an ultrasonic wave transmission medium provided between the outer tank and an inner tank, for example, water, and are irradiated on a substrate to be cleaned, for example, a semiconductor wafer, in the inner tank through a cleaning chemical in the inner tank. By irradiating the ultrasonic waves from the side of the cleaning apparatus, a support base blocks the least amount of ultrasonic waves from reaching the substrate. This is effective to uniformly clean the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.