Chemically adsorbed monomolecular lamination film
US5380585A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 1993 |
| Grant date | Jan 10, 1995 |
| Priority date | — |
| Expiry date | Mar 26, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31667
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention to provide a chemically adsorbed monomolecular lamination film comprising a chemically adsorbed monomolecular film formed via a siloxane-based monomolecular or polymer film on a substrate surface. It also seeks to provide a method of forming a chemically adsorbed monomolecular film efficiently and with high density on a substrate surface with few hydroxyl groups, which method comprises a step of contacting a substrate containing hydroxyl groups present on the surface with a non-aqueous solution containing a material with plural chlorosilanol groups in molecule, a step of removing the material remaining on the substrate without reaction by washing the substrate with a non-aqueous organic solution (if this process is omitted, the siloxane-based polymer film is prepared on the substrate), a step of forming a monomolecular film constituted by a compound containing a silanol group in molecule on the substrate by exposing to the air containing moisture or washing with water, after the removal step, and a step of laminating a monomolecular adsorption film by abosorbing a chlorosilane-based surface active agent constituted by a straight hydrocarbon chain having a chlorosilane…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.