Block and graft copolymers as adhesion promoters
US5384192A · kind A · utility
13Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 11, 1993 |
| Grant date | Jan 24, 1995 |
| Priority date | — |
| Expiry date | Mar 11, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A structure comprising an inorganic oxide substrate having thereon an organic polymer layer, characterized in that interposed between the substrate and the organic polymer layer there is an adhesion promoting layer of a block or graft copolymer, one component of which is compatible with the organic polymer and a second of which is a poly(vinyl phenol) component that is capable of hydrogen bonding with the inorganic oxide substrate is disclosed. In preferred embodiments, the substrate is a semiconductor material and the adhesion promoter facilitates the adhesion of a photoresist or protective coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.