Fabricating lens array structures for imaging devices
US5384231A · kind A · utility
9Cited by
2References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 24, 1993 |
| Grant date | Jan 24, 1995 |
| Priority date | — |
| Expiry date | Aug 24, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/001
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming a planarized layer on a CCD device to permit a lens array to be formed which includes etching a B.sub.2 O.sub.3 layer provided on a conformally coated SiO.sub.2 layer until a sufficient amount of the deposited B.sub.2 O.sub.3 layer is removed to provide a planarized surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.