Apparatus and method for emulating a substrate
US5384899A · kind A · utility
95Cited by
5References
50Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 16, 1991 |
| Grant date | Jan 24, 1995 |
| Priority date | — |
| Expiry date | Apr 16, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F3/04845
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for creating an emulation of a substrate, the method including generating and storing a digital representation of a first feature of a substrate, manipulating the digital representation of the first feature for producing a digital representation of a second feature of the substrate, and repeating the storing and manipulating, thereby emulating a plurality of features of the substrate, wherein the generating includes generating a random pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.