Atmospheric pressure CVD process for preparing fluorine-doped tungsten oxide films
US5385751A · kind A · utility
5Cited by
11References
19Claims
0Family size
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Key dates
| Filing date | Jul 6, 1993 |
| Grant date | Jan 31, 1995 |
| Priority date | — |
| Expiry date | Jul 6, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A film of fluorine-doped tungsten oxide is provided on a substrate by reacting together tungsten alkoxide, an oxygen-containing compound, and a fluorine-containing compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.