Exposure unit and method for exposing photosensitive materials
US5386268A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 26, 1993 |
| Grant date | Jan 31, 1995 |
| Priority date | — |
| Expiry date | Jul 26, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/201
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure unit and method for imaging a photosensitive material includes a source of radiation for exposing the photosensitive material to actinic radiation such that the radiation strikes the photosensitive material at a plurality of angles of incidence, and apparatus for moving the radiation source relative to and in a plane parallel to the photosensitive material. The exposure unit also has a reflector for controlling (1) the proportion of (a) radiation having perpendicular angles of incidence to (b) radiation having non-perpendicular angles of incidence, such that the radiation having non-perpendicular angles is increased, and (2) the distribution of non-perpendicular angles of incidence.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.