Gas anti-solvent recrystallization and application for the separation and subsequent processing of RDX and HMX
US5389263A · kind A · utility
36Cited by
13References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 20, 1992 |
| Grant date | Feb 14, 1995 |
| Priority date | — |
| Expiry date | May 20, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S149/124
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Disclosed is a process for recrystallizing materials that are ordinarily difficult-to-comminute. The process utilizes supercritical fluids and gasses at conditions near their respective vapor pressures which have the ability to dissolve in and expand liquid solutions. The process has been shown to be particularly effective at separating HMX and RDX thereby resulting in a precipitate of RDX which is essentially free of HMX.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.