Semiconductor treatment apparatus
US5395446A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1993 |
| Grant date | Mar 7, 1995 |
| Priority date | — |
| Expiry date | Dec 3, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67023
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor treatment apparatus has a gas-phase decomposing device for decomposing a gas-phase on a surface of a semiconductor substrate, a substrate supporting device for supporting the substrate, and a substrate transfer device for transferring the substrate between the gas-phase decomposing device and the substrate supporting device. The apparatus further has a liquid-drop applicator for applying a liquid-drop on the surface of the substrate supported by the substrate supporting device, with the liquid-drop being brought into contact with the surface of the substrate, and a liquid-drop preserving device for preserving the liquid-drop that has been applied to the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.