Process for depositing layers having high specific electrical conductivity

US5395642A · kind A · utility

Assignee

• Solvay Deutschland GmbH · DE

Inventors

• Andreas Hamerich · Elmshorn, DE
• Joerg Mueller · Bonn, DE
• Guenther Doellein · Hannover, DE
• Lars Lottermoser · Sittensen, DE

Key dates

• Filing date: Dec 17, 1993
• Grant date: Mar 7, 1995
• Expiry date: Dec 17, 2013

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/52
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process for depositing metal-containing layers which have a high specific electrical conductivity, involving the decomposition of organometallic compounds in a hydrogen-containing gas or vapor phase by means of a plasma. The energy density of the plasma is optimized, which involves recording an OES spectrum. It is thus possible to produce, e.g., strongly adhering conductor tracks whose width is less than 50 .mu.m and whose ratio of height to width is greater than 1. Also disclosed are a method for optimizing the deposition of metal-containing layers having a high specific conductivity, and a composite body produced by the process of the invention comprising a polymer substrate and a metal layer deposited thereon.