Electron lithography using a photocathode
US5395738A · kind A · utility
26Cited by
4References
16Claims
0Family size
Inventors
Key dates
| Filing date | Dec 29, 1992 |
| Grant date | Mar 7, 1995 |
| Priority date | — |
| Expiry date | Dec 29, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Sub-micron pattern delineation, importantly in the fabrication of large scale integrated devices, is based on a patterned photocathode. Functionally, the photocathode plays the role of the mask in competing systems, either in proximity printing or in projection. In operation, the photocathode is illuminated by ultraviolet radiation to release electrons which are brought to focus on a resist-coated wafer with assistance of a uniform magnetic field together with an accelerating applied voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.