Method for fabricating electrode patterns
US5395740A · kind A · utility
8Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 27, 1993 |
| Grant date | Mar 7, 1995 |
| Priority date | — |
| Expiry date | Jan 27, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming electrode patterns on a substrate. A transparent substrate (10) is patterned with a photoresist layer (14) on the front side so that portions (18) of the substrate are revealed. A metal oxide layer (12) is deposited on the patterned photoresist layer and the revealed portions of the substrate. The patterned photoresist layer is then exposed to actinic radiation (19) through the back side (25) of the transparent substrate. The photoresist pattern (20) is removed, carrying with it those portions of the metal oxide layer deposited on the photoresist layer, forming an electrode pattern (22) by a lift-off technique.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.