Apparatus for chemical vapor deposition of diamond including thermal spreader
US5397396A · kind A · utility
18Cited by
6References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 27, 1993 |
| Grant date | Mar 14, 1995 |
| Priority date | — |
| Expiry date | Dec 27, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Temperature uniformity and control in apparatus for chemical vapor deposition of diamond is improved by contacting the rear of the substrate assembly, which may be a substrate or a holder containing substrates, with a thermal spreader, preferably of copper and preferably having heating means embedded therein or associated therewith. The thermal spreader contacts a thermal resistance unit, preferably of stainless steel, which in turn is in contact with a cooling element that preferably has coolant passages therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.