Image forming method including heat development while covering surface of light-sensitive material
US5397676A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 8, 1994 |
| Grant date | Mar 14, 1995 |
| Priority date | — |
| Expiry date | Feb 8, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0285
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a new image forming method. The image forming method uses a light-sensitive material. The light-sensitive material comprises a support and a light-sensitive polymerizable layer. The light-sensitive polymerizable layer contains silver halide, a reducing agent and an ethylenically unsaturated polymerizable compound or a cross-linkable polymer. Any of the silver halide, the reducing agent, the polymerizable compound and the polymer are not encapsulated in the layer. The image forming method comprising the steps of imagewise exposing to light the light-sensitive material and simultaneously or thereafter heating the light-sensitive material at a temperature of not lower than 70.degree. C. At the heat development, the silver halide is developed and the polymerizable compound or the cross-linkable polymer is hardened. Thus, a hardened image is formed on the light-sensitive material. The heat development is conducted while covering a surface of the light-sensitive polymerizable layer with a sheet or a heating means. According to the present invention, a space of 0.5 to 500 .mu.m intervenes between the surface of the light-sensitive polymerizable layer and the…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.