Exposure apparatus
US5398271A · kind A · utility
6Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 18, 1994 |
| Grant date | Mar 14, 1995 |
| Priority date | — |
| Expiry date | Jan 18, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7075
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A exposure apparatus for a semiconductor wafer, a liquid crystal display panel and so on. The exposure apparatus comprises a light source, a holding means and a moving means. The light source exposes a target such as a semiconductor wafer, a liquid crystal display panel and so on. The holding means alternately holds and releases the target. The moving means for moving the holding means includes a table and a shifting means. The table moves in the direction of the light source. The shifting means shifts the holding means toward or against the table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.