Process for producing a phosphor layer by reacting a doped substance with silica

US5399185A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Thomas Berthold · Munich, DE
• Christa Grabmaier · Starnberg, DE

Key dates

• Filing date: Dec 15, 1993
• Grant date: Mar 21, 1995
• Expiry date: Dec 15, 2013

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C2218/32
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

A doped starting substance is applied to a substrate composed of SiO.sub.2 glass. A phosphor layer is formed by reaction of the starting substance with SiO.sub.2 of the substrate to form a silicate of the starting substance. This reaction is carried out in a heat-treatment process in an oxygen-containing atmosphere. Zn or Gd is preferably used as starting substance.