Catalysis in organometallic CVD of thin metal films

US5403620A · kind A · utility

Assignee

• The Regents of the University of California · US

Inventors

• Herbert D. Kaesz · Los Angeles, US
• Robert F. Hicks · Los Angeles, US

Key dates

• Filing date: Oct 13, 1992
• Grant date: Apr 4, 1995
• Expiry date: Oct 13, 2012

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/44
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process for CVD including plasma enhanced and laser induced CVD using one or more precursor film forming metal compounds as the major film forming metal precursor, for example organotungsten, which is admixed with minor amounts of a precursor catalytic metal compound, for example, an organoplatinum compound, as a precursor to a catalytic metal in the presence of hydrogen gas to provide improved purity of deposited metal films having residual amounts of the catalytic metal incorporated therein.