Photo-mask
US5403683A · kind A · utility
7Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 5, 1993 |
| Grant date | Apr 4, 1995 |
| Priority date | — |
| Expiry date | Aug 5, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.