Self-cleaning chemical vapor deposition apparatus and method
US5405654A · kind A · utility
5Cited by
24References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 11, 1992 |
| Grant date | Apr 11, 1995 |
| Priority date | — |
| Expiry date | Dec 11, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A self-cleaning chemical vapor deposition (CVD) apparatus and method allow CVD reactors to operate long periods of time without manual removal of extraneous materials such as soot and fuzz. The apparatus is made self-cleaning by superposing a scraping member having a surface, such as a glass rod, over an inner surface of a reactor, and effecting relative movement between the inner surface and scraping member surface. Preferably the reactor is tilted at an angle to horizontal to enhance removal of extraneous material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.