Mask alignment mark system
US5407763A · kind A · utility
32Cited by
10References
24Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 28, 1992 |
| Grant date | Apr 18, 1995 |
| Priority date | — |
| Expiry date | May 28, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/975
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment mark system and method of using the same wherein each mask of a sequence of masks includes a mask sequence indicium, a first alignment feature and a second alignment feature spaced from the first alignment feature. Each of the mask sequence indicium, the first alignment feature and the second alignment feature produce a corresponding structure as a result of the photolithographic process. The structure resulting from the second alignment feature is aligned with the first alignment feature of the immediately succeeding mask for proper alignment of the mask sequence.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.