Apparatus for supplying high purity fluid
US5409526A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 1993 |
| Grant date | Apr 25, 1995 |
| Priority date | — |
| Expiry date | Oct 5, 2013 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF17C2270/0518
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for supplying high purity gas comprises a cylinder having a valve with two internal ports. One internal port is used to fill the cylinder while the other is fitted with a unit which removes particulates and impurities from the gas as it leaves the cylinder. The unit comprises an inlet, a first filter for removing coarse particulates, layers of adsorbent and absorbent for removing impurities, and a second filter for removing fine particulates. The purified gas leaves the cylinder via the valve and after passing through a regulator, a flow control device and various lengths of tubing passes through a conventional purifier immediately upstream of the point of use. The apparatus reduces the load on the purifier and hence decreases the frequency at which the purifier has to be recharged. Potentially the apparatus could obviate the need for the purifier altogether.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.