Etchant, detergent and device/apparatus manufacturing method
US5409569A · kind A · utility
20Cited by
5References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 28, 1993 |
| Grant date | Apr 25, 1995 |
| Priority date | — |
| Expiry date | Sep 28, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An etchant which generates neither heat nor gas during the process, does not sublimate, is stable for a long period of time, requires no special pipings, and further requires no special treatment of waste water because of containing no organic solvents. The etchant is a solution containing hydrofluoric acid and an-oxoacid or oxoacid salt compound expressed by Mm(XOn)p (where M is hydrogen, one-to three-valence metal or NH.sub.4, m is 1 or 5, X is a halogen element, n is 3, 4 or 6, and p is 1, 2 or 3).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.