Laser reprofiling system for correction of astigmatisms
US5411501A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 4, 1993 |
| Grant date | May 2, 1995 |
| Priority date | — |
| Expiry date | Jun 4, 2013 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61F2009/00872
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Apparatus and methods are disclosed for astigmatically ablating surfaces in order to impart new profiles and curvatures to such surfaces. A laser means, e.g., a rapidly pulsed laser radiation source, is aligned with a surface to provide photoablative pulses of energy along an optical path to a target region on the surface. A light restricting means, such as an adjustable iris or profiled mask, is disposed within the optical path to spatially control the extent of the laser radiation striking the target surface. The light restricting means is adapted to permit orientation (e.g., tilting) in various planes relative to the optical path in order to modify the symmetry of the laser beam, e.g., from a circular shape to an elliptical shape, and thereby provide astigmatic ablation of the surface in a single step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.