Patent · US Expired

Use of derivatives of 6,6-dimethyl-2-acylcyclohex-4-en-1,3-diones in the sun protection sector of the cosmetics industry, preparations containing these derivatives, novel derivative and process for the production thereof

US5411728A · kind A · utility

6Cited by
3References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 2, 1994
Grant dateMay 2, 1995
Priority date
Expiry dateMar 2, 2014

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C49/753
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

Use of derivatives of 6,6-dimethyl-2-acylcyclohex-4-en-1,3-diones in the sun protection sector of the cosmetics industry and preparations containing these derivatives, novel derivative and process for the production thereof. Use of a 6,6-dimethyl-2-acylcyclohex-4-en-1,3-dione derivative of the formula (I) ##STR1## in which R.sub.1 is a C.sub.1 -C.sub.6 alkyl radical, R.sub.2 is a hydrogen atom or a C.sub.1 -C.sub.6 alkyl radical, R.sub.3 is a hydrogen atom, a hydroxy radical or a C.sub.1 -C.sub.6 alkoxy radical as a sunscreen, preparations containing this derivative, novel derivative and process for the production thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.