Photosensitive material exposure apparatus
US5414490A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1993 |
| Grant date | May 9, 1995 |
| Priority date | — |
| Expiry date | Dec 23, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To provide a photosensitive material exposure apparatus which is easy for soft focusing exposure. A liquid crystal light regulation member 72 capable of holding light transmission and scattering functions reversibly is disposed between a light source 54 and paper 12. Original image light from a negative film 10 is made to pass through the liquid crystal light regulation member 72, so that the paper 12 is exposed to the light which has passed through the liquid crystal light regulation member 72. The relation of haze (%) with the ratio B/A of the distance B between the liquid crystal light regulation member 72 and the paper 12 to the distance A between the negative film 10 and the paper 12 is represented by B/A<0.3-0.0025 H, preferably, B/A<0.3-0.0029 H. The light transmission and scattering functions can be held wholly or partly or for every pixel by controlling current conduction to electrodes, so that the liquid crystal light regulation member 72 can be made to serve as a soft focusing filter. A photosensitive material can be subjected to soft focusing exposure easily by electric controlling without mechanical motion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.