Arrangement for cleaning semiconductor wafers using mixer
US5415191A · kind A · utility
69Cited by
8References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 17, 1994 |
| Grant date | May 16, 1995 |
| Priority date | — |
| Expiry date | Jun 17, 2014 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B2203/005
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
For cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line thereto, a mixer is provided. Deionized water is supplied to the mixer through a deionized water supply line, and a cleaning gas is supplied thereto from a gas reservoir to produce the cleaning fluid. After treating the semiconductor wafers with the cleaning fluid, the deionized water is supplied to the cleaning vessel to rinse them.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.