Transparent polyamide compositions having high resistance to chemical agents
US5416172A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 18, 1992 |
| Grant date | May 16, 1995 |
| Priority date | — |
| Expiry date | Dec 18, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L77/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Transparent polyamide compositions having high resistance to chemical agents, as well as the process for their preparation and the articles obtained from said compositions. The present polyamide compositions contain from 1 to 99% by weight, preferably 40 to 90% by weight, of a first polyamide consisting of aliphatic units containing at least 7 carbon atoms, isophthalic and terephthalic diacids, the latter being predominant, and cycloaliphatic diamine units, and from 99 to 1% by weight, preferably 60 to 10%, of a semi-crystalline polyamide consisting of at least 35%, preferably 50%, by weight of an aliphatic unit containing at least 7 carbon atoms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.