Process for cleaning harmful gas
US5417948A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 1993 |
| Grant date | May 23, 1995 |
| Priority date | — |
| Expiry date | Oct 28, 2013 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D53/68
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
There is disclosed a process for cleaning a gas containing a nitrogen fluoride especially nitrogen trifluoride as the harmful component which comprises bringing the gas into contact with a cleaning agent comprising zirconium or a zirconium-based alloy such as Zr-Fe, Zr-Cu, Zr-Ni, Zr-Al, Zr-Mg, Zr-Ca, Zr-Zn, Zr-La and Zr-Ce to remove the harmful component at 100.degree. to 800.degree. C., especially 150.degree. to 500.degree. C. The process is capable of efficiently removing nitrogen fluoride, especially nitrogen trifluoride at a relatively low temperature without generating a harmful byproduct such as nitrogen oxide, and thus exhibits excellent effect on the cleaning of exhaust gas from semiconductor manufacturing process, etc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.