Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
US5418112A · kind A · utility
124Cited by
12References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 10, 1993 |
| Grant date | May 23, 1995 |
| Priority date | — |
| Expiry date | Nov 10, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0037
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method useful for stereolithography that yields enhanced photospeed, as well as a photocurable polymer composition well adapted for use with same, are disclosed. A preferred combination includes 1,2-dimethoxy-2-phenyl acetophenone, benzophenone, and triphenyl phosphine combined with a polyurethane (meth)acrylate oligomer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.