Method of and apparatus for removing debris from the floptical medium
US5419733A · kind A · utility
10Cited by
6References
40Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 5, 1994 |
| Grant date | May 30, 1995 |
| Priority date | — |
| Expiry date | Jan 5, 2014 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24C3/22
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The current invention substantially removes particulate waste materials or debris from the floptical medium after laser etching. A low-temperature gas containing ice crystals is applied at a predetermined angle while the floptical medium is being rotated to improve the cleaning effect. The temperature of the disk is maintained above freezing to maintain the cleaning effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.