Stripping with aqueous composition containing hydroxylamine and an alkanolamine
US5419779A · kind A · utility
72Cited by
18References
5Claims
0Family size
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Inventor
Key dates
| Filing date | Dec 2, 1993 |
| Grant date | May 30, 1995 |
| Priority date | — |
| Expiry date | Dec 2, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/14
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of monoethanolamine, about 22.5 to 15% by weight of hydroxylamine and water. The stripping composition is effective to strip photoresists, residues from plasma process generated, organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.