Patent · US Expired

Low temperature method of making very high structure silica

US5419888A · kind A · utility

20Cited by
12References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 23, 1993
Grant dateMay 30, 1995
Priority date
Expiry dateJun 23, 2013

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/90
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

Precipitated silica gels having high surface areas and low oil absorption values are produced by a low temperature synthesis precipitation process. The precipitated silicas have unique flatting characteristics and are additionally useful as conditioning agents for food and salt and in dentifrice formulations.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.