Apparatus for vaporizing liquid raw material and apparatus for forming thin film
US5421895A · kind A · utility
35Cited by
18References
6Claims
0Family size
Inventors
Key dates
| Filing date | Dec 22, 1992 |
| Grant date | Jun 6, 1995 |
| Priority date | — |
| Expiry date | Dec 22, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4486
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for vaporizing a liquid raw material comprises a nozzle with an open tip end for ejecting a liquid raw material into a heated gas atmosphere as liquid droplets and a heated plate with a small opening disposed in front of the nozzle, a space opposite to that occupied by the nozzle with respect to the plate being evacuated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.