Light-resistant polyaniline light-shielding film and liquid crystal display device using the same
US5422194A · kind A · utility
9Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 28, 1994 |
| Grant date | Jun 6, 1995 |
| Priority date | — |
| Expiry date | Apr 28, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K2323/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light-resistant polyaniline light-shielding film, comprising a thin polyaniline film in which Lewis acid is contained in an amount of 0.1 to 5 mol % per monomer unit of the polyaniline. The thin film is used as a black matrix for a liquid crystal display device. The device thus obtained has high reliability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.