Method of treating a vanadium-containing residue
US5427603A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Nov 12, 1993 |
| Grant date | Jun 27, 1995 |
| Priority date | — |
| Expiry date | Nov 12, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC22B34/22
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The starting material is a vanadium-containing residue, which contains at least 5 weight percent carbon on an anhydrous basis. The residue is thermally treated in a furnace a) at temperatures from 400.degree. to 700.degree. C. under an oxidizing atmosphere and an O.sub.2 partial pressure of at least 10.sup.-4 bar, measured within the region which is occupied by the residue, and/or b) at temperatures from 500.degree. to 1300.degree. C. under an O.sub.2 partial pressure not in excess of 10.sup.-2 bar, measured within the region which is occupied by the residue. A solids mixture which contains at least 5 weight percent vanadium oxide is withdrawn from the furnace. A multiple-hearth furnace or a rotary kiln or a fluidized bed reactor containing a stationary or circulating fluidized bed may be used as a furnace for the thermal treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.