Treatment for imparting stain resistance to polyamide substrates and resulting stain resistant materials
US5428117A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 18, 1993 |
| Grant date | Jun 27, 1995 |
| Priority date | — |
| Expiry date | Oct 18, 2013 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD06M13/256
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A composition for imparting stain resistance to polyamide substrates comprising a sulfonated fatty composition and sulfonated hydroxyaromatic formaldehyde condensation polymer. A method for making the stain treatment composition, a method for treating polyamide substrates with the composition, and the resulting stain resistant polyamide materials are also disclosed. Suitable sulfonated hydroxyaromatic formaldehyde condensation polymers include sulfonated phenol formaldehyde condensation polymer and sulfonated dihydroxy diphenyl formaldehyde condensate polymer. Suitable sulfonated fatty compositions include sulfonated oleic acid and marine oil.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.