Facility and gas management system
US5428555A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 20, 1993 |
| Grant date | Jun 27, 1995 |
| Priority date | — |
| Expiry date | Apr 20, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B19/042
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
An interactive computer controlled management system for real-time data gathering and analysis of process information relating to a plurality of data sources in a facility and for controlling process functions of the data sources. In a preferred embodiment, the data sources include gas cabinet panels and related process equipment typically found in a wafer fab facility. The system operates in a distributed processor environment and includes a host processor having graphic, control and user interfaces and a multi-ported processor networked to the host processor. The multi-ported process includes protocol sensitive hardware interfaces for communication with the programmable logic controllers of each particular data source. The multi-ported processor also includes software means for emulating a common protocol such that each gas cabinet or other connected device appears to the host processor as an address location in a memory of the multi-ported processor. The address locations are sequentially polled by the host for updated status, alarm and set point information which is displayable at the host terminal. The functions of the management system are divided into three primary informati…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.