Metallurgical silicon powder exhibiting low surface oxidation
US5429866A · kind A · utility
19Cited by
6References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 6, 1993 |
| Grant date | Jul 4, 1995 |
| Priority date | — |
| Expiry date | Dec 6, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2993
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Silicon or silicon alloy exhibiting low surface oxidation as a result of a surface silica layer of less than 2 nm, and production processes by means of grinding under a minimally-reactive atmosphere in the presence of an oil or by atomization in a vacuum or in a minimally-reactive gas under reduced pressure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.