Patent · US Expired

Process for the formation of a barrier layer on a surface of a glass object

US5431707A · kind A · utility

4Cited by
11References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 2, 1993
Grant dateJul 11, 1995
Priority date
Expiry dateSep 2, 2013

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C2218/152
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

There is formed a silicon-base antimigration barrier layer by projection, on a hot surface of a glass object, in an unconfined ambient atmosphere from a gaseous mixture comprising neutral gas, a silicon precursor, typically a silane, between 10 and 60% of ammonia and preferably less than 5% oxygen, the ratio of the oxygen and silane contents being comprised between 0 and 4. It is useful particularly for the treatment of sodium-calcium glass receptacles to prevent migration of ions into liquids contained in the receptacles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.