Process for the formation of a barrier layer on a surface of a glass object
US5431707A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 2, 1993 |
| Grant date | Jul 11, 1995 |
| Priority date | — |
| Expiry date | Sep 2, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/152
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
There is formed a silicon-base antimigration barrier layer by projection, on a hot surface of a glass object, in an unconfined ambient atmosphere from a gaseous mixture comprising neutral gas, a silicon precursor, typically a silane, between 10 and 60% of ammonia and preferably less than 5% oxygen, the ratio of the oxygen and silane contents being comprised between 0 and 4. It is useful particularly for the treatment of sodium-calcium glass receptacles to prevent migration of ions into liquids contained in the receptacles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.