Patent · US Expired

Method of forming optical light guides through silicon

US5431775A · kind A · utility

13Cited by
2References
11Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 29, 1994
Grant dateJul 11, 1995
Priority date
Expiry dateJul 29, 2014

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B2006/12061
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of forming optical light guides through silicon is disclosed wherein such light guides extend from a first (or front) surface along a preferred crystallographic direction to a second (or back) surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.