Aqueous cleaning concentrates
US5431847A · kind A · utility
34Cited by
46References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 13, 1993 |
| Grant date | Jul 11, 1995 |
| Priority date | — |
| Expiry date | Oct 13, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/122
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention is directed to aqueous cleaning concentrates such as for cleaning electronic circuit assemblies comprising 15-30 wt. % of a composition containing alkaline salt, an alkali metal silicate to boost detersive action or to provide corrosion protection to the substrates which are cleaned, an anionic polymer comprising a high molecular weight polyacrylic acid which stabilizes the alkali metal silicate to prevent precipitation of the silicate from solution, surfactants, and a hydrotrope to maintain the surfactants in solution and the balance water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.