Sample position controller in focused ion beam system
US5434422A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1994 |
| Grant date | Jul 18, 1995 |
| Priority date | — |
| Expiry date | Mar 4, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed is a sample position controller in a focused ion beam system in which a reference unit quantity on a surface of a sample having a structure in which a pattern is repeated at regular intervals is calculated on the basis of the quantity of movement of the sample to which a focused ion beam is radiated and a cyclic detection signal outputted from a charged particle detector with the sample movement as changing correspondingly to the change of the arrangement structure of the surface of the sample, so that the sample position is set on the basis of the reference unit quantity while controlling the moving operation of a sample moving mechanism by using the reference point set on the sample and the reference unit quantity calculated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.