Lithographic photosensitive printing plate comprising a photoconductor and a naphtho-quinone diazide sulfonic acid ester of a phenol resin
US5437952A · kind A · utility
24Cited by
9References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 26, 1993 |
| Grant date | Aug 1, 1995 |
| Priority date | — |
| Expiry date | Feb 26, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/153
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive lithographic printing plate comprises a conductive support and provided thereon, a photoconductive layer of a composition comprising a photoconductor and an esterified compound of o-naphtho-quinonediazide sulfonic acid with a phenol resin, the phenol resin being a polycondensation compound of a monovalent phenol with an aldehyde or a ketone, and the content of the o-naphthoquinonediazide sulfonic acid residue being 0.4.times.10.sup.-3 to 3.0.times.10.sup.-3 mole per gram of the photoconductive layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.