Semiconductor cleaning apparatus and wafer cassette
US5445171A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1993 |
| Grant date | Aug 29, 1995 |
| Priority date | — |
| Expiry date | Sep 20, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A semiconductor cleaning apparatus having: a loader/unloader portion for injecting/ejecting a product cassette which accommodates a wafer; a product injecting/ejecting portion for injecting/ejecting the wafer from the product cassette; a cleaning portion for cleaning the wafer; a water cleaning portion for, with water, cleaning the wafer which has been cleaned in the cleaning portion; a drying portion for drying the wafer which has been cleaned with water in the water cleaning portion; and a conveyance portion having a wafer hand for directly holding the wafer ejected from the product cassette in the product injecting/ejecting portion and sequentially conveying the wafer held by the wafer hand to the cleaning portion, the water cleaning portion and the drying portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.