Patent · US Expired

On-line process flow and reaction monitor

US5447692A · kind A · utility

16Cited by
10References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 10, 1994
Grant dateSep 5, 1995
Priority date
Expiry dateNov 10, 2014

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T436/11
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The present invention makes use of a single detector to monitor several process functions, e.g. reaction efficiency, reagent flow rates, the presence of empty reagent reservoirs, the absence of a chemical reactor column in the system, blockage of flow system, etc., at a single location in the flow system. In accordance with the detection scheme of the present invention, only one detector is required to accomplish the same, if not more, functions as many detectors in the prior art instruments. In the described embodiment, an optical detector is positioned downstream of a chemical reaction chamber. This detector monitors the effluent from the reaction chamber to monitor the reaction efficiency. It also monitors the system functions upstream of the reaction chamber. System flow rate is monitored by detecting the presence of a gas bubble which has been introduced into the system at a known instance. Depletion of reagents in the reservoirs can be detected by monitoring the absence of the reagents at the detector at times when the reagents are expected. The flow system may be periodically diagnosed to check for flow blockage or missing flow component, by monitoring the flow past the dete…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.