Substrates treated with bis(hydroxyphenyl) sulfone stain-resists
US5447755A · kind A · utility
9Cited by
5References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 5, 1994 |
| Grant date | Sep 5, 1995 |
| Priority date | — |
| Expiry date | Aug 5, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31942
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Polyamide fibrous substrates which resist staining by acid dyes and discoloration upon exposure to UV light, and processes for preparing the same which comprise applying, at pH 2 to 10, a base-catalyzed condensation product formed by the reaction of a bis(hydroxyphenyl)sulfone with formaldehyde to give a product known as a resole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.